Plan View Sample Preparation

ABSTRACT

A method and apparatus for altering the orientation of a charged particle beam sample is presented. Embodiments of the method includes providing a first work piece on a sample stage having a sample stage plane, the first work piece including a lamella plane in a first orientation. A sample is milled from the first work piece using an ion beam so that the sample is substantially free from the first work piece. A probe is attached to the sample, the probe including a shaft having a shaft axis, the shaft axis oriented at a shaft angle in relation to the sample stage plane, the shaft angle being non-normal to the sample stage plane. The probe is rotated about the shaft axis through a rotational angle so that the lamella plane is in a second orientation. The sample is attached to or placed on the sample on either the first work piece, the first work piece being the work piece from which the sample was milled, or on a second work piece, the second work piece being a work piece from which the sample was not milled. The sample is thinned using the ion beam to form a lamella, the lamella being oriented in the lamella plane.

TECHNICAL FIELD OF THE INVENTION

The present invention relates to preparation of samples for viewing incharged particle beam systems.

BACKGROUND OF THE INVENTION

Charged particle beam microscopy, such as scanning ion microscopy andelectron microscopy, provides significantly higher resolution andgreater depth of focus than optical microscopy. In a scanning electronmicroscope (SEM), a primary electron beam is focused to a fine spot thatscans the surface to be observed. Secondary electrons are emitted fromthe surface as it is impacted by the primary electron beam. Thesecondary electrons are detected, and an image is formed, with thebrightness at each point on the image being determined by the number ofsecondary electrons detected when the beam impacts a corresponding spoton the surface. Scanning ion microscopy (SIM) is similar to scanningelectron microscopy, but an ion beam is used to scan the surface andeject the secondary electrons.

In a transmission electron microscope (TEM), a broad electron beamimpacts the sample and electrons that are transmitted through the sampleare focused to form an image of the sample. The sample must besufficiently thin to allow many of the electrons in the primary beam totravel though the sample and exit on the opposite site. Samples aretypically less than 100 nm thick.

In a scanning transmission electron microscope (STEM), a primaryelectron beam is focused to a fine spot, and the spot is scanned acrossthe sample surface. Electrons that are transmitted through the workpiece are collected by an electron detector on the far side of thesample, and the intensity of each point on the image corresponds to thenumber of electrons collected as the primary beam impacts acorresponding point on the surface.

Because a sample must be very thin for viewing with transmissionelectron microscopy (whether TEM or STEM), preparation of the sample canbe delicate, time consuming work. The term “TEM” sample as used hereinrefers to a sample for either a TEM or an STEM and references topreparing a sample for a TEM are to be understood to also includepreparing a sample for viewing on an STEM. One method of preparing a TEMsample is to cut the sample from a work piece substrate using an ionbeam. A probe is attached to the sample, either before or after thesample has been entirely freed from the work piece. The probe can beattached, for example, by static electricity, FIB deposition, or anadhesive. The sample, attached to the probe, is moved away from the workpiece from which it was extracted and typically attached to a TEM gridusing FIB deposition, static electricity, or an adhesive.

FIG. 1 shows a typical TEM grid 100, which comprises a partly circular 3mm ring. In some applications, a sample 104 is attached to a finger 106of the TEM grid by ion beam deposition or an adhesive. The sampleextends from the finger 106 so that in a TEM (not shown) an electronbeam will have a free path through the sample 104 to a detector underthe sample. The TEM grid is typically mounted horizontally onto a sampleholder in the TEM with the plane of the TEM grid perpendicular to theelectron beam, and the sample is observed.

Some dual beam systems include an ion beam that can be used forextracting the sample, and an electron beam that can be used for SEM orSTEM observation. In some dual beam systems, the FIB is oriented anangle, such as 52 degrees, from the vertical and an electron beam columnis oriented vertically. In other systems, the electron beam column istilted and the FIB is oriented vertically or also tilted. The stage onwhich the sample is mounted can typically be tilted, in some systems upto about 60 degrees.

TEM samples can be broadly classified as “plan view” samples or “crosssectional view” samples, depending on how the sample was oriented on thework piece. If the face of the sample to be observed was parallel to thesurface of the work piece, the sample is referred to as a “plan view”sample. If the face to be observed was perpendicular to the work piecesurface, the sample is referred to as a “cross sectional view” sample.

FIG. 2 shows a cross-sectional view TEM sample 200 that is partlyextracted from a work piece 202 using a typical process. An ion beam 204cuts trenches 206 and 208 on both side of sample to be extracted,leaving a thin lamella 210 having a major surface 212 that will beobserved by an electron beam. The sample 200 is then freed by tiltingthe work piece 202 in relation to an ion beam, and cutting around itssides and bottom. A probe 216 attaches to the top of the sample 200,before or after it is freed, and transports the sample to a TEM grid.FIG. 2 shows sample 200 almost entirely freed, remaining attached by atab 218 on one side. FIG. 2 shows ion beam 204 ready to sever tab 218.

As shown in FIG. 2, the major surface 212 is oriented vertically.Transporting the lamella typically does not change its orientation, soits major surfaces are still oriented vertically when the sample 200 isbrought to a TEM sample holder. The plane of the TEM grid 100 istypically oriented vertically as shown in FIG. 3, so that the sample 200can be attached to the TEM grid in such a way that major surface 212extends parallel to the plane of the grid, and the grid structure willnot interfere with the transmission of electrons when the grid ismounted in a TEM. The ion beam can be used to attach the extractedsample to the TEM grid by ion beam deposition. Once attached, the faceof the sample 200 can also be thinned using the ion beam. FIG. 3 showsthe sample 200 being attached to the TEM grid 100 in a grid support 302on a sample stage 304. Sample 200 is attached to grid using an ion beam204 and a deposition precursor gas 310 from a nozzle 312. FIG. 4 showsthat the stage 304 is rotated and tilted so that the sample 200 issubstantially perpendicular to the ion beam 204 so that the sample 200can be thinned by the ion beam.

FIG. 5 shows a work piece 500 from which a plan view sample 502 is beingextracted to view a face 504 of the sample. The sample 502 is undercutby two intersecting ion beam cuts 506A and 506B from oppositedirections, and then the ion beam cuts the sides 508A and 508B tosubstantially free a portion of the work piece 500 that includes sample502. A probe 510 is attached to the top of the sample 502. The extractedsample is therefore oriented horizontally. If the sample were attachedin a horizontal orientation to a vertically oriented TEM grid, thesample would extend normal to the plane of the grid, and the grid wouldinterfere with the electron beam of the TEM. If the sample were mountedin a horizontally oriented TEM grid, the face 504 to be observed wouldface upward. It would then be difficult in a conventional FIB system tothin the back side of the plan view sample 502 without removing the TEMgrid from the vacuum chamber and flipping it over to expose the backside of sample 502 for thinning.

This problem of the orientation of a plan view TEM sample 502 has beenovercome in the past by using a “flip stage,” on which the TEM grid canbe oriented horizontally for attaching the plan view sample, and thenthe stage can be flipped 180 degrees and rotated so that the backside ofthe sample can be presented normal to the ion beam for thinning. A flipstage is described for example in U.S. Pat. No. 6,963,068 to Asselbergset al. for “Method for the manufacture and transmissive irradiation of asample, and particle-optical system” and provides a degree of freedomnot available on conventional stages. Such flip stages are expensive andnot available in all FIB systems.

In addition, it is desirable to make plan view samples suitable forex-situ liftout. Ex-situ liftout comprises leaving the thin lamella in awafer and then extracting the lamella in a separate bench-top systemusing an extraction device such as a glass needle. Presently, there isnot a way to extract a plan view sample for ex-situ liftout from a fullwafer or similar substrate. What is needed is a way to reorient a planview sample so that the orientation of the plan view sample is changedfrom being substantially horizontal relative to the surface of the waferto substantially vertical relative to the surface of the wafer.

SUMMARY OF THE INVENTION

An object of the invention is to provide a method and apparatus foraltering the orientation of a charged particle beam sample. Embodimentsof the method includes providing a first work piece on a sample stagehaving a sample stage plane, the first work piece including a lamellaplane in a first orientation. A sample is milled from the first workpiece using an ion beam so that the sample is substantially free fromthe first work piece. A probe is attached to the sample, the probeincluding a shaft having a shaft axis, the shaft axis oriented at ashaft angle in relation to the sample stage plane, the shaft angle beingnon-normal to the sample stage plane. The probe is rotated about theshaft axis through a rotational angle so that the lamella plane is in asecond orientation. The sample is attached to or placed on the sample oneither the first work piece, the first work piece being the work piecefrom which the sample was milled, or on a second work piece, the secondwork piece being a work piece from which the sample was not milled. Thesample is thinned using the ion beam to form a lamella, the lamellabeing oriented in the lamella plane.

Embodiments of the apparatus include an ion beam column, a sample stage,a probe, and a controller. The sample stage includes a sample stageplane and is capable of moving in at least two dimensions and ofrotating about a vertical axis. The probe is rotatable around a shaftaxis. The shaft axis is oriented at a shaft angle in relation to thesample stage plane. The shaft angle is non-normal to the sample stageplane. The controller causes the ion beam column, the sample stage, theprobe, to perform the steps of supporting a first work piece on thesample stage, the first work piece including a lamella plane; milling asample from the first work piece using an ion beam from the ion beamcolumn so that the sample is substantially free from the first workpiece; attaching the probe to the sample; rotating the probe about theshaft axis through a rotational angle; attaching the sample to orplacing the sample on the first work piece, the first work piece beingthe work piece from which the sample was milled or a second work piece,the second work piece being a work piece from which the sample was notmilled; and thinning the sample using the ion beam column to form alamella, the lamella being oriented in the lamella plane.

The foregoing has outlined rather broadly the features and technicaladvantages of the present invention in order that the detaileddescription of the invention that follows may be better understood.Additional features and advantages of the invention will be describedhereinafter. It should be appreciated by those skilled in the art thatthe conception and specific embodiment disclosed may be readily utilizedas a basis for modifying or designing other structures for carrying outthe same purposes of the present invention. It should also be realizedby those skilled in the art that such equivalent constructions do notdepart from the spirit and scope of the invention as set forth in theappended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

For a more through understanding of the present invention, andadvantages thereof, reference is now made to the following descriptionstaken in conjunction with the accompanying drawings, in which:

FIG. 1 shows a typical TEM grid to which a sample is attached;

FIG. 2 shows a cross-sectional TEM sample being extracted from a workpiece;

FIG. 3 shows the cross-sectional TEM sample of FIG. 2 being mounted onthe TEM grid of FIG. 1;

FIG. 4 shows the sample and grid of FIG. 3 tilted and rotated forthinning the sample using an ion beam;

FIG. 5 shows a TEM sample being extracted from a work piece;

FIG. 6 shows a typical dual beam system used to implement the presentinvention;

FIG. 7 is a flow chart showing the steps of a preferred embodiment ofthe present invention;

FIG. 8 shows plan view sample 800 formed in work piece 803;

FIG. 9 shows probe 802 attached to sample 800;

FIG. 10 shows sample 800 removed from work piece 803 before probe 802 isrotated through the non-zero rotational angle;

FIG. 11 shows sample 800 removed from work piece 803 after probe 802 isrotated through the non-zero rotational angle;

FIG. 12 shows a sample 800 disposed at the attachment location on workpiece 803 after probe 802 is rotated through the non-zero rotationalangle; and

FIG. 13 shows sample 800 thinned by ion beam 618 at the attachmentlocation on work piece 803 to form a lamella 1302.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

This disclosure relates to novel methods for preparing a plan viewsample for ex-situ liftout. In one embodiment, the invention facilitatespreparation of a plan view sample for viewing in TEMs or STEMs. Themethods provide for extracting and mounting a plan view sample onto aTEM grid in such a manner that the sample can be extracted, attached,and thinned without requiring a flip stage and without requiring thatthe TEM grid to be removed from the vacuum chamber and reoriented.Re-orienting the sample may also facilitate other analytical orprocessing operations on the sample.

FIG. 6 shows a typical ion beam system, focused ion beam (FIB) system610, suitable for practicing the present invention. FIB system 610includes an evacuated envelope having an upper neck portion 612 withinwhich are located a liquid metal ion source 614 or other ion source anda focusing column 616. Other types of ion sources, such as multicusp orother plasma sources, and other optical columns, such as shaped beamcolumns, could also be used, as well as electron beam and laser system.

An ion beam 618 passes from liquid metal ion source 614 through ion beamfocusing column 616 and between electrostatic deflection meansschematically indicated at deflection plates 620 toward work piece 622,which comprises, for example, a semiconductor device positioned on stage624 within lower chamber 626. Stage 624 can also support one or more TEMsample holders, so that a sample can be extracted from the semiconductordevice and moved to a TEM sample holder. Stage 624 can preferably movein a horizontal plane (X and Y axes) and vertically (Z axis). Stage 624can also tilt approximately sixty (60) degrees and rotate about the Zaxis. A system controller 619 controls the operations of the variousparts of FIB system 610. Through system controller 619, a user cancontrol ion beam 618 to be scanned in a desired manner through commandsentered into a conventional user interface (not shown).

Alternatively, system controller 619 may control FIB system 610 inaccordance with programmed instructions.

For example, a user can delineate a region of interest on a displayscreen using a pointing device, and then the system could automaticallyperform the steps described below to extract a sample. In someembodiments, FIB system 610 incorporates image recognition software,such as software commercially available from Cognex Corporation, Natick,Mass., to automatically identify regions of interest, and then thesystem can manually or automatically extract samples in accordance withthe invention. For example, the system could automatically locatesimilar features on semiconductor wafers including multiple devices, andtake samples of those features on different (or the same) devices.

An ion pump 628 is employed for evacuating upper neck portion 612. Thelower chamber 626 is evacuated with turbomolecular and mechanicalpumping system 630 under the control of vacuum controller 632. Thevacuum system provides within lower chamber 626 a vacuum of betweenapproximately 1×10⁻⁷ Torr (1.3×10⁻⁷ mbar) and 5×10⁻⁴ Torr (6.7×10⁻⁴mbar). If an etch-assisting gas, an etch-retarding gas, or a depositionprecursor gas is used, the chamber background pressure may rise,typically to about 1×10⁻⁵ Torr (1.3×10⁻⁵ mbar).

High voltage power supply 634 is connected to liquid metal ion source614 as well as to appropriate electrodes in ion beam focusing column 616for forming an approximately 1 keV to 60 keV ion beam 618 and directingthe same toward a sample. Deflection controller and amplifier 636,operated in accordance with a prescribed pattern provided by patterngenerator 638, is coupled to deflection plates 620 whereby ion beam 618may be controlled manually or automatically to trace out a correspondingpattern on the upper surface of work piece 622. In some systems thedeflection plates are placed before the final lens, as is well known inthe art. Beam blanking electrodes (not shown) within ion beam focusingcolumn 616 cause ion beam 618 to impact onto blanking aperture (notshown) instead of target 622 when a blanking controller (not shown)applies a blanking voltage to the blanking electrode.

The liquid metal ion source 614 typically provides a metal ion beam ofgallium. The source typically is capable of being focused into a subone-tenth micrometer wide beam at work piece 622 for either modifyingthe work piece 622 by ion milling, enhanced etch, material deposition,or for the purpose of imaging the work piece 622. A charged particledetector 640, such as an Everhart Thornley or multi-channel plate, usedfor detecting secondary ion or electron emission is connected to a videocircuit 642 that supplies drive signals to video monitor 644 andreceiving deflection signals from controller 619.

The location of charged particle detector 640 within lower chamber 626can vary in different embodiments. For example, a charged particledetector 640 can be coaxial with the ion beam and include a hole forallowing the ion beam to pass. In other embodiments, secondary particlescan be collected through a final lens and then diverted off axis forcollection. A scanning electron microscope (SEM) 641, along with itspower supply and controls 645, are optionally provided with the FIBsystem 610.

A gas delivery system 646 extends into lower chamber 626 for introducingand directing a gaseous vapor toward work piece 622. U.S. Pat. No.5,851,413 to Casella et al. for “Gas Delivery Systems for Particle BeamProcessing,” assigned to the assignee of the present invention,describes a suitable gas delivery system 646. Another gas deliverysystem is described in U.S. Pat. No. 5,435,850 to Rasmussen for a “GasInjection System,” also assigned to the assignee of the presentinvention. For example, iodine can be delivered to enhance etching, or ametal organic compound can be delivered to deposit a metal.

A micromanipulator 647, such as the EasyLift™ NanoManipulator Systemfrom FEI Company, Hillsboro, Oreg., assignee of the present invention,the AutoProbe 200™ from Omniprobe, Inc., Dallas, Tex., or the Model MM3Afrom Kleindiek Nanotechnik, Reutlingen, Germany, can precisely moveobjects within the vacuum chamber. Micromanipulator 647 may compriseprecision electric motors 648 positioned outside the vacuum chamber toprovide X, Y, Z, and theta control of a portion 649 positioned withinthe vacuum chamber. The micromanipulator 647 can be fitted withdifferent end effectors for manipulating small objects. In theembodiments described below, the end effector is a thin probe 650. Thethin probe 650 may be electrically connected to system controller 619 toapply an electric charge to the probe 650 to control the attractionbetween a sample and the probe.

A door 660 is opened for inserting work piece 622 onto X-Y stage 624,which may be heated or cooled, and also for servicing an internal gassupply reservoir, if one is used. The door is interlocked so that itcannot be opened if the system is under vacuum. The high voltage powersupply provides an appropriate acceleration voltage to electrodes in ionbeam focusing column focusing 616 for energizing and focusing ion beam618. When it strikes work piece 622, material is sputtered, that isphysically ejected, from the sample. Alternatively, ion beam 618 candecompose a precursor gas to deposit a material. Focused ion beamsystems are commercially available, for example, from FEI Company,Hillsboro, Oreg., the assignee of the present application. While anexample of suitable hardware is provided above, the invention is notlimited to being implemented in any particular type of hardware.

FIG. 7 describes the steps of a preferred method of preparing a planview TEM sample. The process begins at start block 702. In step 704, anion beam, preferably a focused ion beam, mills a plan view sample in thework piece, substantially or completely freeing the sample from the workpiece. FIG. 8 shows plan view sample 800 formed in work piece 803. Planview sample 800 includes a lamella plane 814 that is substantiallyparallel to the plane of sample stage 801 and/or the top surface of thework piece 803. The lamella that is formed in accordance with thismethod is oriented in the lamella plane 814. In a preferred embodimentof the present invention, sample 800 is milled so that at least one face816 of the milled sample is substantially perpendicular to lamella plane814.

In step 706, a probe 802 having a shaft axis 804 is attached to sample800. Probe 802 can be attached to sample 800 by ion beam deposition.Alternatively, probe 802 can be attached to sample 800 by an adhesive orother means known to a skilled artisan. Probe shaft 802 is attached to amicromanipulator 810, which can move probe 802 in three dimensions andcan rotate probe 802 about shaft axis 804. Probe 802 preferably remainsat a fixed angle 812 to the plane of the sample stage when the samplestage is in its untilted orientation. Angle 812 is non-normal to samplestage plane 801 (or the top surface of work piece 803). Angle 812 ispreferably 45 degrees to the sample stage plane (or top surface of workpiece 803). The tip of probe 802 is preferably cut at the same angle asangle 812, so that the flat area of the probe tip is parallel to theplane of the sample stage in its untilted orientation. The probe isattached to the sample 800 as shown in FIG. 9. The probe 800 can beattached, for example, using focused ion beam deposition of a metal,such as tungsten, to the sample and the probe. To attach probe 802 tosample 800, the probe tip is preferably brought near the top surface ofsample 800 and attached to sample 800 by ion beam deposition, asdescribed, for example, in U.S. Pat. No. 7,615,745 to Schampers et al.,which is incorporated by reference in its entirety into the presentspecification. A precursor gas, such as tungsten hexacarbonyl, W(CO)₆,is directed toward the gap between the tip of probe 802 and sample 800,as the ion beam is directed to scan the area around the point ofcontact. The ion beam is used to induce decomposition of the precursorgas to deposit a material that bridges the gap and connects the sample800 to the tip of probe 802. In alternative embodiments, probe 800 isbrought into contact with the top surface of sample 800 and attached tosample 800 by ion beam deposition, by use of an adhesive, by means ofattractive forces (e.g., electrostatic, Van der Waals, etc.) betweensample 800 and probe 802, or by other suitable means known in the art.

In step 708, probe 802 is rotated about shaft axis 804 through anon-zero rotational angle. Sample 800 may need to be lifted out fromwork piece 803 for a distance so that sample 800 has clearance to rotateas probe 802 is rotated. FIG. 10 shows sample 800 removed from workpiece 803 before probe 802 is rotated. FIG. 11 shows sample 800 removedfrom work piece 803 after probe 802 is rotated through the non-zerorotational angle. The rotation of probe 802 causes sample 800 to bere-oriented so that lamella plane 814 is substantially perpendicular tothe top surface of work piece 803 and sample stage plane 801. Oncesample 800 is re-oriented so that lamella plane 814 is substantiallyperpendicular to the top surface of work piece 803 and sample stageplane 801, sample 800 can be processed like a cross-section view sample.In a preferred embodiment, angle 812 between the probe and the samplestage plane is 45 degrees and the rotational angle is 180 degrees. Thatis, by rotating the probe 180 degrees about shaft axis 812, lamellaplane 814 is re-oriented from being substantially parallel to the samplestage plane to being substantially perpendicular to the sample stageplane.

In step 710, sample 800 is preferably moved to an attachment location onthe same work piece surface, as shown in FIG. 12. In alternativeembodiments, sample 800 is moved to an attachment location on adifferent work piece. References to the attachment location on workpiece surface 803 are to be understood to refer to an attachmentlocation on either the same work piece or on a different work piece.Either probe 802 can be moved or the sample stage can be moved torelocate sample 800 to the attachment location. The attachment locationis a location on work piece surface 803 where face 816 of sample 800 isbrought into close proximity or in direct contact with work piecesurface 803 and attached for further processing. In step 712, sample 800is then attached to work piece surface 803, preferably using ion beamdeposition. The ion beam is directed through a precursor gas to form oneor more depositions 902-904. Depositions 902-904 are attached to bothsample 800 and work piece surface 803 thereby fastening sample 800 towork piece surface 803. In alternative embodiments, sample 800 is placedon work piece surface 803 and held in place by use of an adhesive, bymeans of attractive forces (e.g., electrostatic, Van der Waals, etc.)between sample 800 and work piece surface 803, or by other suitablemeans known in the art. In some embodiments, a recessed area thatsubstantially fits sample 800 is milled in work piece surface 803 at theattachment location to make the drop off of the sample 800 morereliable. Once sample 800 is attached to work piece surface 803 at theattachment location, probe 802 can be detached from sample 800,preferably using the FIB to sever the connection.

In step 714, sample 800 is thinned by ion beam 618 at the attachmentlocation on work piece 803 to form a lamella 1302, as shown in FIG. 13.Fiducial 1304 can be used for quickly locating lamella plane 814 and fordetermining the appropriate amount of ion beam milling to perform toform lamella 1302. Lamella 1302 will be oriented substantiallyperpendicular to the top surface of work piece 803 and sample stageplane 801. Lamella 1302 is therefore in the same orientation as alamella formed from a cross-section sample. Once sufficiently thinnedand processed, lamella 1302 can be freed from sample 800 and placed on aTEM grid for viewing in an S/TEM instrument.

Skilled persons will also recognize that the flat surface on the bottomof the probe, while preferred, can be eliminated in some embodiments. Aslong as the sample is fixed to the probe, rotating the probe willre-orient the sample, with the re-orientation angle being determined bythe degree of rotation and the angle between the probe axis and thestage plane. Thus, a rounded probe tip, a probe tip angle in which theprobe tip is not parallel to the stage plane, or any other probe tipshape, is within the scope of the invention.

Although the present invention and its advantages have been described indetail, it should be understood that various changes, substitutions andalterations can be made herein without departing from the spirit andscope of the invention as defined by the appended claims. For example,the angles and orientations described are useful for a system with anion beam oriented at an angle to the vertical. For an ion beam columnthat is oriented vertically, or at any other angle, a skilled person canreadily alter the example described above to provide an appropriateembodiment of the invention. The invention is useful not only for TEMsample preparation, but can be used for SEM or optical microscopeobservation, or for any charged particle beam, laser, or other operationon a microscopic specimen.

Moreover, the scope of the present application is not intended to belimited to the particular embodiments of the process, machine,manufacture, composition of matter, means, methods and steps describedin the specification. As one of ordinary skill in the art will readilyappreciate from the disclosure of the present invention, processes,machines, manufacture, compositions of matter, means, methods, or steps,presently existing or later to be developed that perform substantiallythe same function or achieve substantially the same result as thecorresponding embodiments described herein may be utilized according tothe present invention. Accordingly, the appended claims are intended toinclude within their scope such processes, machines, manufacture,compositions of matter, means, methods, or steps.

We claim as follows:
 1. A method for creating a plan view TEM sample,comprising: providing a first work piece on a sample stage having asample stage plane, the first work piece including a lamella plane beingoriented in a first orientation; milling a sample from the first workpiece using an ion beam so that the sample is substantially free fromthe first work piece; attaching a probe to the sample, the probeincluding a shaft having a shaft axis, the shaft axis oriented at ashaft angle in relation to the sample stage plane, the shaft angle beingnon-normal to the sample stage plane; rotating the probe about the shaftaxis through a rotational angle, the rotation causing the sample to berotated so that the lamella plane is oriented in a second orientation;attaching the sample to or placing the sample on: the first work piece,the first work piece being the work piece from which the sample wasmilled; or a second work piece, the second work piece being a work piecefrom which the sample was not milled; and thinning the sample using theion beam to form a lamella, the lamella being oriented in the lamellaplane.
 2. The method of claim 1 in which the shaft angle is 45 degreesand the rotational angle is 180 degrees.
 3. The method of claim 1 inwhich attaching the probe to the sample includes attaching the probe tothe sample by ion beam deposition.
 4. The method of claim 1 in whichattaching the probe to the sample includes attaching the probe to thesample by an adhesive.
 5. The method of claim 1 in which milling thesample from the first work piece using an ion beam includes milling thesample from the first work piece using a focused ion beam.
 6. The methodof claim 1 in which milling the sample further comprises milling thesample so that one face of the milled sample is substantiallyperpendicular to the lamella plane.
 7. The method of claim 1 in whichattaching the sample to the first or second work piece further comprisesforming at least one deposition on the work piece and the sample, thedeposition attaching the sample to the first or second work pieces. 8.The method of claim 1 in which attaching the sample to or placing thesample on the first or second work piece further comprises milling arecessed area in a surface of the first or second work piece, therecessed area being of a size that suitable to receive at least aportion of the sample, and placing the sample so that at least a portionof the sample is disposed within the recessed area.
 9. The method ofclaim 7 further comprising forming the at least one deposition by ionbeam deposition using the ion beam.
 10. The method of claim 1 in whichrotating the probe about the shaft axis through a rotational anglecauses the sample to be rotated so that the sample stage plane and thelamella plane are substantially perpendicular;
 11. The method of claim10 in which prior to the milling step the lamella plane is substantiallyparallel to the sample stage plane.
 12. The method of claim 1 furthercomprising: milling the lamella from the sample using an ion beam sothat the lamella is substantially free from the sample; attaching thelamella to a transmission electron microscope (TEM) grid; and viewingthe lamella while attached to the transmission electron microscope (TEM)grid.
 13. The method of claim 12 further comprising, prior to millingthe lamella from the sample, moving the work piece upon which the sampleis attached or placed to a second device, the second device being adevice that was not used to mill the sample from the work piece.
 14. Anapparatus for processing a sample, comprising an ion beam column; asample stage having a sample stage plane, the sample stage capable ofmoving in at least two dimensions and of rotating about a vertical axis;a probe, the probe being rotatable around a shaft axis, the shaft axisoriented at a shaft angle in relation to the sample stage plane, theshaft angle being non-normal to the sample stage plane; a controller,the controller causing the ion beam column, the sample stage, the probe,to perform the steps of: supporting a first work piece on the samplestage, the first work piece including a lamella plane; milling a samplefrom the first work piece using an ion beam from the ion beam column sothat the sample is substantially free from the first work piece;attaching the probe to the sample; rotating the probe about the shaftaxis through a rotational angle; attaching the sample to or placing thesample on: the first work piece, the first work piece being the workpiece from which the sample was milled; or a second work piece, thesecond work piece being a work piece from which the sample was notmilled; and thinning the sample using the ion beam column to form alamella, the lamella being oriented in the lamella plane.
 15. Theapparatus of claim 14 in which the ion beam column is a focused ion beamcolumn,
 16. The apparatus of claim 14 in which the probe is oriented at45 degrees to the sample stage
 17. The apparatus of claim 16 in whichthe rotational angle is 180 degrees.
 18. The apparatus of claim 14 inwhich the probe is attached to the sample by a deposition formed fromthe ion beam column.
 19. The apparatus of claim 14 in which the probe isattached to the sample by an adhesive.
 20. The apparatus of claim 14 inwhich the ion beam column is a focused ion beam column.
 21. Theapparatus of claim 14 in which the controller causes the ion beam tomill the sample so that one face of the milled sample is substantiallyperpendicular to the lamella plane.
 22. The apparatus of claim 14 inwhich the sample is attached to the first or second work piece by atleast one deposition formed on the work piece and the sample.
 23. Theapparatus of claim 14 in which the sample is attached to or placed onthe first or second work piece in a recessed area in a surface of thefirst or second work piece milled by the ion beam.
 24. The apparatus ofclaim 14 in which the probe is rotated about the shaft axis so that thesample stage plane and the lamella plane are substantiallyperpendicular;
 25. The apparatus of claim 24 in which the lamella planeis substantially parallel to the sample stage plane prior to milling.26. The apparatus of claim 22 further comprising forming the at leastone deposition by ion beam deposition using the ion beam.
 27. Theapparatus of claim 14 further comprising the controller causing the ionbeam column, the sample stage, the probe, to perform the additionalsteps of: milling the lamella from the sample using an ion beam so thatthe lamella is substantially free from the sample; attaching the lamellato a transmission electron microscope (TEM) grid; and viewing thelamella while attached to the transmission electron microscope (TEM)grid.